- A type of sulfuric acid and hydrogen peroxide
- Suitable for Vertical & Horizontal (High Yield & Low Cost)
- Copper Concentration Resistance (0~50g/L)
- Hydrogen peroxide Decomposition Inhibition
After applying the horizontal line (‘S’ Company) | ||||
---|---|---|---|---|
Parameters | Total Input | Stabilizer(1L vs.) | H2O2 (1L vs.) | Product (1m² vs.) |
35% H2O2 | 1057L | 23L | 1L | 0.11L |
Stabilizer | 46L | 1L | 0.044L | 0.0047L |
Production | 9817m² | 213m² | 9.29m² | 1m² |
Etching rate(㎛) vs. Stabilizer concentration(%)
Etching rate(㎛) vs. Copper concentration(g/L)
Before
Etch Rate (0.5㎛)
Etch Rate (1.0㎛)
Etch Rate (2.0㎛)
Etch Rate (2.5㎛)